Virtual Metrology in Semiconductor Fabrication Foundry Using Deep Learning Neural Networks.
Tze Chiang TinSaw Chin TanChing Kwang LeePublished in: IEEE Access (2022)
Keyphrases
- deep learning
- neural network
- semiconductor devices
- plasma etching
- unsupervised feature learning
- machine learning
- pattern recognition
- unsupervised learning
- high density
- deep architectures
- back propagation
- weakly supervised
- restricted boltzmann machine
- mental models
- field effect transistors
- higher order
- neural nets
- natural images
- data mining