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Separation of interface states and electron trapping for hot carrier degradation in ultra-scaled replacement metal gate n-FinFET.
Miaomiao Wang
Zuoguang Liu
Tenko Yamashita
James H. Stathis
Chia-Yu Chen
Published in:
IRPS (2015)
Keyphrases
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field effect transistors
high speed
metal oxide
user interface
visual interface
user friendly
friendly interface
nano scale
state variables
graphical interface
databases
information systems
case study
state space
partial knowledge
high energy