Gate Stack Optimization Toward Disturb-Free Operation of Ferroelectric HSO based FeFET for NAND Applications.
Konrad SeidelK. BiedermannJan Van HoudtTarek AliRaik HoffmannKati KühnelMalte CzernohorskyMatthias RudolphBjörn PätzoldPhilipp SteinkeK. ZimmermannPublished in: NVMTS (2019)