A DFM Methodology to Evaluate the Impact of Lithography Conditions on the Speed of Critical Paths in a VLSI Circuit.

Peter Wright Minghui Fan

Published in: ISQED (2006)

Keyphrases

high speed
power dissipation
vlsi circuits
sufficient conditions
real time
design methodology
electron beam lithography
low power
power consumption
shortest path
signal processing
environmental conditions
expert systems
high impact
analog vlsi
neural network
databases