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Analyzing the impact of Double Patterning Lithography on SRAM variability in 45nm CMOS.
Vivek Joshi
Michael Wieckowski
Gregory K. Chen
David T. Blaauw
Dennis Sylvester
Published in:
CICC (2010)
Keyphrases
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power consumption
cmos technology
low power
random access memory
nm technology
silicon on insulator
high speed
metal oxide semiconductor
low voltage
electron beam
database
data transmission
integrated circuit
power supply
power reduction
analog vlsi
leakage current
infrared
three dimensional
image processing