Multi-step virtual metrology for semiconductor manufacturing: A multilevel and regularization methods-based approach.
Gian Antonio SustoSimone PampuriAndrea SchirruAlessandro BeghiGiuseppe De NicolaoPublished in: Comput. Oper. Res. (2015)
Keyphrases
- multi step
- semiconductor manufacturing
- regularization methods
- process control
- total variation
- edge preserving
- regularization method
- regularization parameter
- inverse problems
- knn
- k nearest neighbor
- image restoration
- data sets
- control system
- iterative methods
- semi supervised
- partial differential equations
- production system
- image denoising
- mumford shah
- machine learning
- neural network