Ferroelectric Aluminum-Doped Hafnium Oxide for Memory Applications.

Hojoon Ryu Kai Xu Ji Guo Wenjuan Zhu

Published in: DRC (2018)

Keyphrases

room temperature
thin film
silicon nitride
memory usage
electrical properties
main memory
memory size
random access
low memory
memory requirements
data sets
machine learning
bayesian networks
magnetic field
high density
computing power