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Development and Characterization of High Temperature Plasma Nitridation Process for Advanced CMOS Technology Application.

Xiaoxu KangXiaolan ZhongZhangfa ChenZhengkai DaoQiang ZhangHao WanYamin ZhouMing LiYingjia GuoRan NieTao Wu
Published in: ASICON (2021)
Keyphrases
  • power consumption
  • software engineering
  • high temperature
  • neural network
  • case study
  • low power
  • cmos technology