Using Unsupervised Machine Learning for Plasma Etching Endpoint Detection.
Imen ChakrounThomas J. AshbySayantan DasSandip HalderRoel WuytsWilfried VerachtertPublished in: ICPRAM (2020)
Keyphrases
- machine learning
- endpoint detection
- plasma etching
- unsupervised learning
- supervised learning
- supervised classification
- machine learning methods
- semi supervised
- machine learning algorithms
- learning algorithm
- completely unsupervised
- active learning
- computer vision
- feature selection
- decision trees
- machine learning approaches
- machine learning and data mining
- explanation based learning
- transfer learning
- text classification
- data mining
- pattern recognition
- computer science
- computational intelligence
- semi supervised learning
- text mining
- natural language processing
- training data
- inductive logic programming
- thin film
- knowledge representation
- neural network
- low density
- support vector
- computational biology
- database
- learning problems
- statistical methods
- knowledge discovery
- model selection