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A quantitative study of Phosphorous implantation damage on the thick gate oxide of the 28 nm node.

Xinggong WanSandhya ChandrashekharBoris BayhaMartin TrentzschTorben BalzerMahesh SiddabathulaOliver Aubel
Published in: Microelectron. Reliab. (2014)
Keyphrases
  • simulation study
  • qualitative and quantitative
  • learning environment
  • artificial neural networks
  • empirical studies
  • parent child