Optimization and simulation of exposure pattern for scanning laser lithography.
Omid T. GhalehbeygiGarth BerrimanAndrew J. FlemingJohn L. HoldsworthPublished in: CCA (2015)
Keyphrases
- electron beam lithography
- discrete optimization
- simulation environment
- pattern matching
- optimization method
- global optimization
- optimization model
- simulation model
- database
- optimization algorithm
- database systems
- simulation study
- optimization problems
- scan data
- image processing
- optimization methods
- constrained optimization
- artificial neural networks
- search algorithm
- simulation models