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Locally delineating of junctions and defects by local cross-section electron-beam-induced-current technique.
Tohru Koyama
Masataka Umeno
Kenichiro Sonoda
Junko Komori
Yoji Mashiko
Published in:
Microelectron. Reliab. (2001)
Keyphrases
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cross section
electron beam
cross sections
cross sectional
x ray
integrated circuit
design parameters
multislice
image compression
semiconductor devices