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Transistor aging and reliability in 14nm tri-gate technology.
S. Novak
C. Parker
D. Becher
M. Liu
M. Agostinelli
M. Chahal
P. Packan
P. Nayak
Stephen Ramey
S. Natarajan
Published in:
IRPS (2015)
Keyphrases
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metal oxide semiconductor
cmos technology
low power
nm technology
integrated circuit
low cost
leakage current
power dissipation
high speed
power consumption
software aging
field effect transistors
parallel processing
cost effective
case study
data sets
application server
low voltage
information technology