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Feedback control of surface roughness in sputtering processes using the stochastic Kuramoto-Sivashinsky equation.

Yiming LouPanagiotis D. Christofides
Published in: Comput. Chem. Eng. (2005)
Keyphrases
  • feedback control
  • surface roughness
  • closed loop
  • optimal control
  • adaptive control
  • manufacturing process
  • process control
  • single image
  • mathematical model
  • dynamic systems
  • specular reflection
  • curved surfaces