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Impact of interface state trap density on the performance characteristics of different III-V MOSFET architectures.

Brahim BenbakhtiJ. S. Ayubi-MoakKarol KalnaD. LinGeert HellingsGuy BrammertzKristin De MeyerIain ThayneAsen Asenov
Published in: Microelectron. Reliab. (2010)
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