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Effect of Off-State Stress on Data-Valid Window Margin for Advanced DRAM Using HK/MG Process Technology.
Sunhang Lee
Nam-Hyun Lee
G.-J. Kim
J. Ahn
Ik-Hwan Kim
S. Ha
S. Rhee
GH Bae
KW Lee
YS Lee
SB. Ko
S. Pae
Published in:
IRPS (2024)
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