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Effect of Off-State Stress on Data-Valid Window Margin for Advanced DRAM Using HK/MG Process Technology.

Sunhang LeeNam-Hyun LeeG.-J. KimJ. AhnIk-Hwan KimS. HaS. RheeGH BaeKW LeeYS LeeSB. KoS. Pae
Published in: IRPS (2024)
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