Electromagnetic Nanoscale Metrology Based on Entropy Production and Fluctuations.
James Baker-JarvisPublished in: Entropy (2008)
Keyphrases
- semiconductor manufacturing
- mutual information
- process control
- high frequency
- information entropy
- camera calibration
- single view
- neural network
- production scheduling
- information theoretic
- production system
- information theory
- production planning
- atomic force microscopy
- simulation software
- database systems
- computer vision
- information retrieval
- multiple views
- production cost
- production process
- relative entropy
- manufacturing processes
- minimum error
- electromagnetic field
- machine learning