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layers on Si(1 0 0) during vacuum annealing monitored with in situ XPS/LEIS and ex situ AFM.

Andrei ZenkevichYu. LebedinskiiG. ScarelMarco FanciulliAndrey BaturinN. Lubovin
Published in: Microelectron. Reliab. (2007)
Keyphrases
  • simulated annealing
  • atomic force microscopy
  • ultra high
  • image processing
  • similarity measure
  • artificial neural networks
  • multiresolution
  • semi supervised
  • monte carlo
  • database replication
  • annealing algorithm