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A comparative study on a high aspect ratio contact hole etching in UFC- and PFC-containing plasmas.

Hyun-Kyu RyuYil-Wook KimKangtaek LeeChee Burm ShinChang-Koo Kim
Published in: Microelectron. J. (2007)
Keyphrases
  • aspect ratio
  • bounding box
  • camera parameters
  • viewpoint
  • missing data