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Reliability of dual-damascene local interconnects featuring cobalt on 10 nm logic technology.

F. GriggioJames PalmerF. PanN. ToledoAnthony SchmitzIlan TsameretR. KasimGerald S. LeathermanJeffery HicksA. MadhavanJ. ShinJ. SteigerwaldA. YeohC. Auth
Published in: IRPS (2018)
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