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Modeling and Analysis of the Nonrectangular Gate Effect for Postlithography Circuit Simulation.

Ritu SinghalAsha BalijepalliAnupama R. SubramaniamChi-Chao WangFrank LiuSani R. NassifYu Cao
Published in: IEEE Trans. Very Large Scale Integr. Syst. (2010)
Keyphrases
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