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Characteristics of Ni/AlOx/Pt RRAM devices with various dielectric fabrication temperatures.

Zong Jie ShenChun ZhaoC. Z. ZhaoIvona Z. MitrovicLi YangW. Y. XuEng Gee LimT. LuoY. B. Huang
Published in: ICICDT (2019)
Keyphrases
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