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UV-LED Lithography System and Characterization.

Sabera Fahmida ShibaJace BeaversDiego LaramoreBo LindstromJames BrovlesCorey GaitherTyler HieberJungkwun J. K. Kim
Published in: NEMS (2020)
Keyphrases
  • electron beam
  • axiomatic characterization
  • database
  • multiscale
  • neural network
  • feature selection
  • image segmentation
  • multiresolution
  • principal component analysis
  • rough sets
  • electron beam lithography