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Effects of width scaling and layout variation on dual damascene copper interconnect electromigration.
M. H. Lin
K. P. Chang
K. C. Su
Tahui Wang
Published in:
Microelectron. Reliab. (2007)
Keyphrases
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integrated circuit
printed circuit boards
high speed
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negative effects
layout design
real world
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genetic algorithm
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image processing
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multi agent
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