A nonlinear programming approach to exposure optimization in scanning laser lithography.
Andrew J. FlemingAdrian WillsOmid T. GhalehbeygiBen RoutleyBrett NinnessPublished in: ACC (2016)
Keyphrases
- nonlinear programming
- optimization problems
- linear programming
- variational inequalities
- linear constraints
- equality and inequality constraints
- semidefinite programming
- electron beam lithography
- equality constraints
- exact algorithms
- evolutionary algorithm
- mixed integer nonlinear programming
- linear program
- boundary conditions
- genetic algorithm
- metaheuristic
- simulated annealing
- semi supervised
- dynamic programming
- cost function
- optimal solution