Kyungmee O. Kim

Publication Activity (10 Years)

Years Active: 2004-2023
Publications (10 Years): 4

Top Topics

Cost Effectiveness

Optimal Allocation

Top Venues

Reliab. Eng. Syst. Saf.

Qual. Reliab. Eng. Int.

Publications

Kyungmee O. Kim, Seongjun Park, Yujin Hong
Reliability maximization of a load-sharing system without redundant components. Qual. Reliab. Eng. Int. 39 (8) (2023)
Kyungmee O. Kim, Ming Jian Zuo
Optimal allocation of reliability improvement target based on the failure risk and improvement cost. Reliab. Eng. Syst. Saf. 180 (2018)
Kyungmee O. Kim, Ming Jian Zuo
General model for the risk priority number in failure mode and effects analysis. Reliab. Eng. Syst. Saf. 169 (2018)
Kyungmee O. Kim, Taeseong Roh, Jae-Woo Lee, Ming Jian Zuo
Derating design for optimizing reliability and cost with an application to liquid rocket engines. Reliab. Eng. Syst. Saf. 146 (2016)
Kyungmee O. Kim, Yoonjung Yang, Ming Jian Zuo
A new reliability allocation weight for reducing the occurrence of severe failure effects. Reliab. Eng. Syst. Saf. 117 (2013)
Donghoh Kim, Kyungmee O. Kim, Hee-Seok Oh
Extending the Scope of Empirical Mode Decomposition by Smoothing. EURASIP J. Adv. Signal Process. 2012 (2012)
Kyungmee O. Kim
Burn-in considering yield loss and reliability gain for integrated circuits. Eur. J. Oper. Res. 212 (2) (2011)
Kyungmee O. Kim, Way Kuo
Optimal burn-in for maximizing reliability of repairable non-series systems. Eur. J. Oper. Res. 193 (1) (2009)
Kyungmee O. Kim, Hee-Seok Oh
Reliability functions estimated from commonly used yield models. Microelectron. Reliab. 48 (3) (2008)
Kyungmee O. Kim, Ming Jian Zuo
Two fault classification methods for large systems when available data are limited. Reliab. Eng. Syst. Saf. 92 (5) (2007)
Kyungmee O. Kim
Relating integrated circuit yield and time-dependent reliability for various defect density distributions. IEEE Trans. Reliab. 55 (2) (2006)
Kyungmee O. Kim, W. Kuo
Some considerations on system burn-in. IEEE Trans. Reliab. 54 (2) (2005)
Kyungmee O. Kim, Way Kuo, Wen Luo
A relation model of gate oxide yield and reliability. Microelectron. Reliab. 44 (3) (2004)