Sign in
Burn J. Lin
ORCID
Publication Activity (10 Years)
Years Active: 2009-2023
Publications (10 Years): 1
Top Topics
Electron Beam
Augmented Reality
Shortest Path
Neighboring Nodes
Top Venues
ISPD
</>
Publications
</>
Burn J. Lin
Immersion and EUV Lithography: Two Pillars to Sustain Single-Digit Nanometer Nodes.
ISPD
(2023)
Burn J. Lin
Lithography till the end of Moore's law.
ISPD
(2012)
Jack J. H. Chen
,
Faruk Krecinic
,
Jen-Hom Chen
,
Raymond P. S. Chen
,
Burn J. Lin
Future electron-beam lithography and implications on design and CAD tools.
ASP-DAC
(2011)
Burn J. Lin
,
R. G. Liu
Progress and outlook of lithography for semiconductor IC.
CICC
(2009)