RFCMOS technology from 0.25μm to 65nm: the state of the art.

John Pekarik David R. Greenberg Basanth Jagannathan Robert A. Groves J. R. Jones Raminderpal Singh Anil Chinthakindi Xudong Wang Matthew J. Breitwisch Douglas D. Coolbaugh Peter E. Cottrell John E. Florkey Greg G. Freeman R. Krishnasamy

Published in: CICC (2004)

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