RFCMOS technology from 0.25μm to 65nm: the state of the art.
John PekarikDavid R. GreenbergBasanth JagannathanRobert A. GrovesJ. R. JonesRaminderpal SinghAnil ChinthakindiXudong WangMatthew J. BreitwischDouglas D. CoolbaughPeter E. CottrellJohn E. FlorkeyGreg G. FreemanR. KrishnasamyPublished in: CICC (2004)