Electric Double Layer Esaki Tunnel Junction in a 40-nm-Length, WSe2 Channel Grown by Molecular Beam Epitaxy on Al203.
Paolo PalettiAlan C. SeabaughRuoyu YueChristopher L. HinklePublished in: ESSDERC (2018)
Keyphrases
- multi channel
- multi layer
- high speed
- application layer
- three dimensional
- electron beam lithography
- packet size
- communication channels
- channel coding
- simulation model
- ieee trans
- total length
- multiple access
- noisy channel
- neural network
- tunnel boring machine
- cross section
- wireless channels
- power generation
- dna computing
- minimum length
- space charge
- low cost