Oxygen vacancy traps in Hi-K/Metal gate technologies and their potential for embedded memory applications.
Chandrasekharan KothandaramanX. ChenDan MoyD. LeaSami RosenblattFaraz KhanDerek LeuToshiaki KirihataD. IoannouG. La RosaJ. B. JohnsonNorman RobsonSubramanian S. IyerPublished in: IRPS (2015)