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NOx removal performance of a wet reduction scrubber combined with oxidation by an indirect DBD plasma for semiconductor manufacturing industries.
Hak-Joon Kim
Bangwoo Han
Chang-Gyu Woo
Yong-Jin Kim
Published in:
IAS (2017)
Keyphrases
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plasma etching
thin film
neural network
social networks
computer vision
metadata
video sequences
multi agent systems
reduction method
semiconductor manufacturing