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NOx removal performance of a wet reduction scrubber combined with oxidation by an indirect DBD plasma for semiconductor manufacturing industries.

Hak-Joon KimBangwoo HanChang-Gyu WooYong-Jin Kim
Published in: IAS (2017)
Keyphrases
  • plasma etching
  • thin film
  • neural network
  • social networks
  • computer vision
  • metadata
  • video sequences
  • multi agent systems
  • reduction method
  • semiconductor manufacturing