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Multilevel Lasso applied to Virtual Metrology in semiconductor manufacturing.

Simone PampuriAndrea SchirruGiuseppe FazioGiuseppe De Nicolao
Published in: CASE (2011)
Keyphrases
  • semiconductor manufacturing
  • process control
  • machine learning
  • feature selection
  • least squares
  • database
  • face recognition
  • model selection
  • virtual environment
  • virtual laboratory