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Physical modeling and design rules of analog Conductive Metal Oxide-HfO2 ReRAM.
Donato Francesco Falcone
Stephan Menzel
Tommaso Stecconi
Antonio La Porta
Ludovico Carraria-Martinotti
Bert Jan Offrein
Valeria Bragaglia
Published in:
IMW (2023)
Keyphrases
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design process
metal oxide
databases
circuit design
user interface
high resolution
source code
vlsi architecture