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Effect of vacuum break after the barrier layer deposition on the electromigration performance of aluminum based line interconnects.

Cher Ming TanArijit RoyKok Tong TanDerek Sim Kwang YeFrankie Low
Published in: Microelectron. Reliab. (2005)
Keyphrases
  • thin film
  • multi layer
  • input output
  • artificial intelligence
  • neural network
  • machine learning
  • line segments