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Improvement on sheet resistance uniformity of nickel silicide by optimization of silicidation conditions.

Ryuji TomitaHidehiko KimuraM. YasudaK. MaedaS. UenoT. TonegawaT. FujimotoM. MoritokiHiroshi Iwai
Published in: Microelectron. Reliab. (2013)
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