Effect of thermal annealing in H2 atmosphere of SiCxOy films obtained by HFCVD technique.
Juan Carlos Pérez TrinidadMarco Antonio Vasquez-AgustinGodofredo García SalgadoRomán Romano-TrujilloFernando Lopez-MarcosHeber VilchisEnrique Rosendo AndrésJosé Juan Gervacio ArciniegaOrlando Cortazar MartínezAntonio Coyopol SolísPublished in: CCE (2023)