Aggressively Scaled Atomic Layer Deposited Amorphous InZnOx Thin Film Transistor Exhibiting Prominent Short Channel Characteristics (SS= 69 mV/dec.; DIBL = 27.8 mV/V) and High Gm(802 μS/μm at VDS = 2V).
Yan-Kui LiangJune-Yang ZhengYu-Lon LinWei-Li LiYu-Cheng LuDong-Ru HsiehLi-Chi PengTsung-Te ChouChi-Chung KeiChun-Chieh LuHuai-Ying HuangYuan-Chieh TsengTien-Sheng ChaoEdward Yi ChangChun-Hsiung LinPublished in: VLSI Technology and Circuits (2023)