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Development of high-quality low-temperature (≤ 120°C) PECVD-SiN films by organosilane.
Hiroshi Taka
Katsumasa Suzuki
Norihiro Tsujioka
Shoichi Murakami
Published in:
3DIC (2015)
Keyphrases
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high quality
case study
data sets
ground truth
social networks
neural network
image processing
multiscale
information processing
development process
rapid development