A Comprehensive Study on the Pillar Size of OTS-PCM Memory with an Optimized Process and Scaling Trends Down to Sub-10 nm for SCM Applications.
Wei-Chih ChienE. K. LaiL. BuziC. W. ChengC. W. YehA. RayL. M. GignacN. GongH. Y. ChengA. GrunD. Y. LeeW. KimA. MajumdarDouglas M. BishopRobert L. BruceD. DaudelinH. Y. HoM. J. BrightSkyH. L. LungPublished in: IMW (2023)