Exposure Normalization and Compensation for Multiple-Exposure Correction.

Jie Huang Yajing Liu Xueyang Fu Man Zhou Yang Wang Feng Zhao Zhiwei Xiong

Published in: CVPR (2022)

Keyphrases

electron beam lithography
wide range
social networks
knowledge base
high dynamic range imaging
database
databases
neural network
case study
multi agent
information technology
hidden markov models
environmental factors