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Double Patterning Lithography (DPL)-compliant layout construction (DCLC) with area-stitch usage tradeoff.

Debasis PalAbir PramanikParthasarathi DasguptaDebesh Kumar Das
Published in: VDAT (2016)
Keyphrases
  • field of view
  • trade off
  • real time
  • databases
  • neural network
  • artificial intelligence
  • social networks
  • image processing
  • image sequences
  • mobile robot
  • probabilistic model
  • spatial layout