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Dimensional control in corner lithography for wafer-scale fabrication of nano-apertures.
Narges Burouni
Erwin Berenschot
Miko Elwenspoek
Niels R. Tas
Published in:
NEMS (2011)
Keyphrases
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integrated circuit
electron beam
control system
multi dimensional
optimal control
control theory
d objects
semiconductor manufacturing
real time
learning algorithm
search engine
scale space
process control
control problems