High-Power EUV Source for Lithography Using Tin Target.

C. H. Zhang Sunao Katsuki H. Horta H. Imamura Hidenori Akiyama

Published in: IAS (2008)

Keyphrases

high power
low power
power supply
high density
low cost
neural network
high speed
power consumption
genetic algorithm
image compression
computer simulation
end to end