A statistical yield optimization framework for interconnect in double patterning lithography.

Minoo MirsaeediMohab H. Anis
Published in: Microelectron. J. (2011)
Keyphrases
  • statistical analysis
  • real time
  • main contribution
  • framework enables
  • computer vision
  • decision trees
  • databases
  • neural network
  • machine learning
  • model selection
  • conceptual framework
  • optimization model