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Positive Semidefinite Relaxation and Approximation Algorithm for Triple Patterning Lithography.

Tomomi MatsuiYukihide KohiraChikaaki KodamaAtsushi Takahashi
Published in: ISAAC (2014)
Keyphrases
  • learning algorithm
  • optimal solution
  • improved algorithm
  • objective function
  • np hard
  • expectation maximization
  • globally optimal
  • feature extraction
  • convergence rate