Thickness-Engineered Extremely-thin Channel High Performance ITO TFTs with Raised S/D Architecture: Record-Low RSD, Highest Moblity (Sub-4 nm TCH Regime), and High VTH Tunability.
Yuye KangKaizhen HanYue ChenXiao GongPublished in: VLSI Technology and Circuits (2023)
Keyphrases
- thin film
- high reliability
- high efficiency
- significantly lower
- high levels
- database
- multi channel
- wide range
- high sensitivity
- real time
- management system
- embedded dram
- small size
- cost effective
- high noise
- low power consumption
- design considerations
- network architecture
- software architecture
- high correlation
- transaction costs
- cmos technology
- computation intensive
- artificial neural networks