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High aspect ratio etching of nanopores in PECVD SiC through AAO mask.

Songmei WuM.-O. BammatterWei TangV. AuzelyteHaixia ZhangJuergen Brugger
Published in: NEMS (2013)
Keyphrases
  • aspect ratio
  • bounding box
  • principal point
  • ground truth
  • image segmentation