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Genetic Algorithms to Improve Mask and Illumination Geometries in Lithographic Imaging Systems.

Tim FühnerAndreas ErdmannRichárd FarkasBernd TollkühnGabriella Kókai
Published in: EvoWorkshops (2004)
Keyphrases
  • imaging systems
  • genetic algorithm
  • image formation
  • machine vision
  • synthetic aperture
  • light field
  • computer vision
  • preprocessing
  • single image
  • lighting conditions
  • neural network
  • high quality
  • viewpoint
  • semi supervised