Integrating Deep Learning and Explicit MPC for Advanced Process Control.

Justin Katz Iosif Pappas Styliani Avraamidou Efstratios N. Pistikopoulos

Published in: ACC (2020)

Keyphrases

process control
deep learning
control system
unsupervised learning
unsupervised feature learning
machine learning
weakly supervised
semiconductor manufacturing
mental models
restricted boltzmann machine
manufacturing process
deep architectures
data sets
control charts