Carrier separation analysis for clarifying carrier conduction and degradation mechanisms in high-k stack gate dielectrics.
Wataru MizubayashiNaoki YasudaKenji OkadaHiroyuki OtaHirokazu HisamatsuKunihiko IwamotoKoji TominagaKatsuhiko YamamotoTsuyoshi HorikawaToshihide NabatamePublished in: Microelectron. Reliab. (2005)